17th International Conference Reliability and Stress-Related Phenomena in Nanoelectronics
„Stress workshop“
The conference will cover the whole range from fundamental research to industrial applications. It will provide a forum for scientists and engineers from universities, research institutions and industry to discuss current challenges and future scenarios related to reliability and stress-induced phenomena in micro- and nanoelectronics.
Co-Chairs
- Ehrenfried Zschech, deepXscan Dresden & Technische Universität Dresden, Germany
- Reinhold Dauskardt, Stanford University, Palo Alto/CA, USA
- Valeriy Sukharev, Mentor Graphics / Siemens EDA, Fremont/CA, USA
- Olivier Thomas, Aix-Marseille Universite, France
- Zhong Chen, NTU Singapore
Scientific Committee
- Alex Dommann, EMPA, Switzerland
- Martin Gall, GLOBALFOUNDRIES Malta/NY, USA
- Chee Lip Gan, NTU Singapore
- Goeran Jerke, Bosch Stuttgart, Germany
- Junichi Koike, Tohoku University, Sendai, Japan
- Jens Lienig, Technical University Dresden, Germany
- Zhiyong Ma, Intel, Hillsboro/OR, USA
- Jon Molina, IMDEA Materials, Madrid, Spain
- Stephane Moreau, Leti Grenoble, France
- Luu Nguyen, Psi Quantum, Palo Alto/CA, USA
- Natalia Sobczak, IMIM PAN Cracow, Poland
- Oden Warren, Bruker, Minneapolis/MN, USA
- Ingrid de Wolf, IMEC Leuven, Belgium
- Xiaopeng Xu, Synopsys, Mountain View/CA, USA
Organizing Committee
- Dominik Gronarz, Organic Electronics Saxony, Dresden, Germany
- Kim Brendel, Hotel Elbresidenz, Bad Schandau, Germany
- Kristina Kutukova, deepXscan GmbH, Dresden, Germany
- Johann Zeller, student, Dresden, Germany
Sponsors
Organizers
